Method for regeneration of electroless nickel plating solution

Liquid purification or separation – Processes – Ion exchange or selective sorption

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

106 122, 106 127, 210667, 210670, 210688, B01D 1504

Patent

active

056097670

ABSTRACT:
An electroless nickel(EN)/hypophosphite plating bath is provided employing acetic acid/acetate as a buffer and which is, as a result, capable of perpetual regeneration while avoiding the production of hazardous waste. A regeneration process is provided to process the spent EN plating bath solution. A concentrated starter and replenishment solution is provided for ease of operation of the plating bath. The regeneration process employs a chelating ion exchange system to remove nickel cations from spent EN plating solution. Phosphites are then removed from the solution by precipitation. The nickel cations are removed from the ion exchange system by elution with hypophosphorous acid and the nickel concentration of the eluate adjusted by addition of nickel salt. The treated solution and adjusted eluate are combined, stabilizer added, and the volume of resulting solution reduced by evaporation to form the bath starter and replenishing solution.

REFERENCES:
patent: 4303704 (1981-12-01), Courduvelis et al.
patent: 5112392 (1992-05-01), Anderson et al.
patent: 5258061 (1993-11-01), Martyak et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for regeneration of electroless nickel plating solution does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for regeneration of electroless nickel plating solution, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for regeneration of electroless nickel plating solution will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-440568

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.