Method for reflowing and annealing borophosphosilicate glass to

Details Method for reflowing and annealing borophosphosilicate glass to Method for reflowing and annealing borophosphosilicate glass to

1994-08-12

1995-10-24

Hearn, Brian E.

Fishing, trapping, and vermin destroying

437982, 437240, 148DIG133, H01L 21324

Patent

active

054610117

ABSTRACT:
A method of reflowing borophosphosilicate glass wherein wafers on a support that holds the wafers upright in spaced parallel relationship are introduced into a furnace. The wafers are heated to a temperature to achieve reflow while a main stream of heated inert gas is flowed over the wafers in a direction perpendicular to the planes of the substrates, while simultaneously an auxiliary stream of heated inert gas is flowed in a direction perpendicular to the main stream to prevent the formation of BPO.sub.4 crystals during reflow.

REFERENCES:
patent: 4513026 (1985-04-01), Miyamoto et al.
patent: 4879253 (1989-11-01), Wakamatsu
patent: 5094984 (1992-03-01), Liu et al.
Wolf et al., vol. II, Silicon Processing for the VLSI Era, Lattice Press, 1990, pp. 104-105, 194-197, 334-335.

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