Coating processes – Electrical product produced – Welding electrode
Patent
1982-08-27
1984-10-02
Smith, John D.
Coating processes
Electrical product produced
Welding electrode
65102, 65104, 427 85, 427 93, 4273981, 427444, H01L 21268, H01L 21324
Patent
active
044748310
ABSTRACT:
In a method for reflow of a phosphosilicate glass (PSG) layer applied to a semiconductor wafer, the wafer is placed in a processing chamber in parallel alignment with a planar blackbody source. The chamber is evacuated, and the source rapidly and uniformly heats the PSG layer to a temperature at which plastic flow occurs. The blackbody source provides significant radiation in the 7-10 micron portion of the infrared spectrum. The thermal treatment is typically completed in 8-15 seconds, thereby avoiding impurity redistribution in the semiconductor device.
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Cole Stanley Z.
McClellan William R.
Smith John D.
Varian Associates Inc.
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