Method for reflection-type two-dimensional pattern-reducing-copy

Details Method for reflection-type two-dimensional pattern-reducing-copy Method for reflection-type two-dimensional pattern-reducing-copy

1990-12-26

1992-06-09

Berman, Jack I.

Radiant energy

Irradiation of objects or material

2504922, 355 71, 378 34, H01L 2126

Patent

active

051209713

ABSTRACT:
The invention relates to a method and a device for reflection-type pattern copying, characterized by letting beams of light be incident on a pattern reflection plate on which a pattern to be copied is drawn, converging a pattern figure contained in the light reflected by the pattern reflection plate by means of a concave mirror and copying a two-dimensionally reduced pattern of the above pattern onto a surface of a specimen. Unlike conventional methods, the invention achieves two-dimensional reduced pattern copying by using one concave convergence mirror. A region of copying in which the blur size is not larger than a certain sufficiently small value can be expanded by parallelly arrnaging many concave convergence mirrors having the same shape and combining mechanical sweeping of the pattern reflection plate and the specimen.

REFERENCES:
patent: 4231657 (1980-11-01), Iwamatsu
patent: 4355891 (1982-10-01), Cole et al.
patent: 4980563 (1990-12-01), George et al.
Hideki Matsumura, "Theoretical Consideration on New Reflection Type X-Ray Lithography," Extended Abstracts of the 18th Conference on Solid State Devices and Materials, Tokyo, 1986, pp. 17-20.
H. Kinoshita et al., "Soft x-ray reduction lithography using multilayer mirros," (Jul. 11, 1989), pp. 1648-1650.

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