Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Treating polymer containing material or treating a solid...
Patent
1976-07-15
1979-09-18
Henderson, Jr., Christopher A.
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
Treating polymer containing material or treating a solid...
526216, 526229, 526317, 5263293, 526343, 528487, C08F 616, C08F 614
Patent
active
041683722
ABSTRACT:
A method for reducing the amount of free vinylidene chloride in an aqueous dispersion of a vinylidene chloride polymer by adding to the dispersion a small amount of a redox initiator, and then subjecting the dispersion to a temperature in the range of room temperature to about 40.degree. C. for a period of at least one hour. Substrates such as packaging films can be coated with the aqueous dispersion, or with a solvent solution of the polymer after separation from the dispersion. By use of such a coating bath, the amount of vinylidene chloride vapor in the atmosphere near the coating station is significantly less than the amount when using a coating bath of polymer not subjected to the method of the invention.
REFERENCES:
patent: 2662867 (1953-12-01), Hoertz
patent: 2776273 (1957-01-01), Richard
patent: 2843572 (1958-07-01), Wooten, Jr.
patent: 3423352 (1969-01-01), Levine
patent: 3532675 (1970-10-01), Rivlin
patent: 3692726 (1972-09-01), Oehmichen
patent: 3832317 (1974-10-01), Mikofalvy
patent: 4008361 (1977-02-01), Park
patent: 4015065 (1977-03-01), Park
E. I. Du Pont de Nemours and Company
Henderson, Jr. Christopher A.
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