Method for reducing the surface of silicon dioxide

Details Method for reducing the surface of silicon dioxide Method for reducing the surface of silicon dioxide

2005-05-24

2005-05-24

Nguyen, Ngoc-Yen (Department: 1754)

Chemistry of inorganic compounds

Silicon or compound thereof

Oxygen containing

C174S034000

Reexamination Certificate

active

06896862

ABSTRACT:
There is described a method for reducing the surface area of silicon dioxide, which is characterized in that silicon dioxide is introduced into an electromagnetic shielding device selected from an aluminum/magnesium metal shielding device and a hypomagnetic chamber of Permalloy steel, and is incubated for a period of at least 3 hours, preferably at least 6 hours.

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