Method for reducing temperature variations across a semiconducto

Details Method for reducing temperature variations across a semiconducto Method for reducing temperature variations across a semiconducto

1984-06-13

1985-12-24

Roy, Upendra

Metal treatment

Compositions

Heat treating

29576T, 29576B, 148187, H01L 21265

Patent

active

045604207

ABSTRACT:
Temperature variations across the surface of a semiconductor wafer (12), having at least one major surface thereof exposed to a source of radiant heat energy (18), are reduced by positioning a reflective ring (30, 30', 30" or 30'") proximate the wafer edge (28). The reflective ring (30, 30', 30" or 30'") reflects the heat energy towards the wafer periphery (27) to provide substantially uniform heat across the wafer.

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