Method for reducing phosphorous contamination in a vacuum proces

Details Method for reducing phosphorous contamination in a vacuum proces Method for reducing phosphorous contamination in a vacuum proces

1983-09-22

1985-04-23

Caroff, Marc L.

Cleaning and liquid contact with solids

Processes

Including use of vacuum, suction, or inert atmosphere

134 2218, 134 30, 134 31, 134 42, B08B 704, B08B 900

Patent

active

045128120

ABSTRACT:
A method for reducing contamination in a vacuum processing chamber includes introducing into the vacuum chamber a gas selected to react with the contaminant and form a compound more volatile than the contaminant. The volatile compound is then removed from the vacuum chamber, typically by vacuum pumping. In one embodiment, the vacuum chamber is an ion implantation chamber, the contaminant is phosphorous and the gas is water vapor, which reacts with the phosphorous to form phosphine gas or other high vapor pressure phosphorous-containing substances.

REFERENCES:
patent: 3615956 (1971-10-01), Irving et al.
patent: 4138306 (1979-02-01), Niwa

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