Method for reducing leaching in metal-coated MEMS

Coating processes – Electrical product produced

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C427S331000, C216S002000, C216S099000, C438S745000, C438S753000

Reexamination Certificate

active

06939574

ABSTRACT:
A method is provided for preventing dopant leaching from a doped structural film during fabrication of a microelectromechanical system. A microstructure that includes the doped structural film, sacrificial material, and metallic material is produced with a combination of deposition, patterning, and etching techniques. The sacrificial material is dissolved with a release solution that has a substance destructive to the sacrificial material. This substance also acts as an electrolyte, forming a galvanic cell with the doped structural film and metallic material acting as electrodes. The effects of the galvanic cell are suppressed by including a nonionic detergent mixed in the release solution.

REFERENCES:
patent: 5824910 (1998-10-01), Last et al.
patent: 6525352 (2003-02-01), Muller et al.
patent: 6616853 (2003-09-01), Staple et al.
Ashruf et al., galvanic porous silicon formation without external electrodes, Sensors and Actuators (74) 1999, pp. 118-122.
Gennissen et al. “Sacrificial oxide etching compatible with aluminum metallization”, 1997 International Conference on Solid-State sensors and Actuators, ppg. 225-228.
Bustillo et al., “Surface Micromachining for Microelctrochemical Systems”, Proceeding of the IEEE, vol. 86, No. 8, Aug. 1998 pp. 1552-1574.
Ark-Chew Wong, John R. Clark and Clark T.-C. Nguyen, Anneal-Activated, Tunable 68 MHz Micromechanical Filters, Center for Integrated Microsystems, Dept. of Electrical and Computer Science, University of Michigan, Ann Arbor, Michigan 48109, Transducers '99, Jun. 7-10, 1999, pp. 1390-1393, Sendai, Japan.
Ashuf, C.M.A., et al., “Galvanic porous silicon formation without external contacts,” Sensors and Actuators 74, Jun. 1999, pp. 118-122.
Torcheux, L., et al., “Electrochemical Coupling Effects on the corrosion of Silicon Samples in HF Solutions,” J. Electrochem. Soc., vol. 142, No. 142, No. 6 Jun. 1995, pp. 2037-2046.
Keller, Christopher Guild, “Microfabricated Silicon High Aspect Ratio Flexures for In-Plane Motion,” dissertation submitted in the graduate division of the University of California, Berkeley, Fall 1998.
Muller, Lilac, “Gimballed Electrostatic Microactuators with Embedded Interconnects,” dissertation submitted in the graduate division of the University of California, Berkeley, Spring 2000.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for reducing leaching in metal-coated MEMS does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for reducing leaching in metal-coated MEMS, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for reducing leaching in metal-coated MEMS will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3403286

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.