Method for reducing immunogenic and/or toxic substances in indoo

Static structures (e.g. – buildings) – Processes – Filling preformed cavity

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

521691, 521695, 5216914, 52303, E04B 100, E04B 170, E02D 1702, E04F 1700

Patent

active

050037501

ABSTRACT:
A method for reducing the amount of immunogenic and/or toxic substances in a building's indoor air. The method is particularly directed at reducing the level of gases generated by certain wood and/or petrochemical based building materials. The method also serves to reduce levels of electromagnetic radiation within the building.

REFERENCES:
patent: 530646 (1894-12-01), MacLeod
patent: 3020618 (1962-02-01), Eward
patent: 3287866 (1966-11-01), Bevilacqua
patent: 4075810 (1978-02-01), Zakrzewski
patent: 4078347 (1978-03-01), Eastman
patent: 4486986 (1984-12-01), Cosenza
patent: 4523875 (1985-06-01), DiFiore
patent: 4578912 (1986-04-01), Ericsson
patent: 4580487 (1986-04-01), Sosnowski
patent: 4620398 (1986-11-01), Wallin
patent: 4621476 (1986-11-01), MacGregor
patent: 4760674 (1988-08-01), Brand
patent: 4798034 (1989-01-01), Jarnagin
patent: 4843786 (1989-07-01), Walkinshaw
patent: 4858521 (1989-08-01), Heh
Philip K. Hopke, Editor, "Radon and its Delay Products", University of Illinois, (American Chemical Society, Washington, D.C. 1987) pp. 526-586.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for reducing immunogenic and/or toxic substances in indoo does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for reducing immunogenic and/or toxic substances in indoo, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for reducing immunogenic and/or toxic substances in indoo will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-319899

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.