Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement
Patent
1998-02-03
1999-11-16
Young, Christopher G.
Radiation imagery chemistry: process, composition, or product th
Including control feature responsive to a test or measurement
382149, G03F 900
Patent
active
059854979
ABSTRACT:
An arrangement for optimizing a lithographic process forms a pattern on a silicon wafer using a photocluster cell system to simulate an actual processing condition for a semiconductor product. The resist pattern is then inspected using a wafer inspection system. An in-line low voltage scanning electron microscope (SEM) system reviews and classifies defect types, enabling generation of an alternative processing specification. The alternative processing specification can then be tested by forming patterns on different wafers, and then performing split-series testing to analyze the patterns on the different wafers for comparison with the existing lithographic process and qualification for production.
REFERENCES:
patent: 5736281 (1998-04-01), Watson
patent: 5817445 (1998-10-01), Bae
patent: 5871874 (1999-02-01), Tounai
Bains Gurjeet S.
Orth Jonathan A.
Phan Khoi A.
Steele David A.
Subramanian Ramkumar
Advanced Micro Devices , Inc.
Young Christopher G.
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