Method for reducing defect concentrations in crystals

Single-crystal – oriented-crystal – and epitaxy growth processes; – Processes of growth with a subsequent step acting on the...

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C117S001000, C117S068000, C117S069000, C117S070000

Reexamination Certificate

active

10455007

ABSTRACT:
A method for removing defects at high pressure and high temperature (HP/HT) or for relieving strain in a non-diamond crystal commences by providing a crystal, which contains defects, and a pressure medium. The crystal and the pressure medium are disposed in a high pressure cell and placed in a high pressure apparatus, for processing under reaction conditions of sufficiently high pressure and high temperature for a time adequate for one or more of removing defects or relieving strain in the single crystal.

REFERENCES:
patent: 5679153 (1997-10-01), Dmitriev et al.
patent: 6001748 (1999-12-01), Tanaka et al.
patent: 6013591 (2000-01-01), Ying et al.
patent: 6214108 (2001-04-01), Okamoto et al.
patent: 6217842 (2001-04-01), Tanino
patent: 6447600 (2002-09-01), Furukawa et al.
patent: 2002/0059901 (2002-05-01), Vodakov et al.
patent: 2002/0069818 (2002-06-01), Naito et al.
patent: 1 122 342 (1991-08-01), None
patent: 02-124729 (1990-05-01), None
patent: 06 305900 (1994-11-01), None
patent: 10-114533 (1998-05-01), None
patent: 1 682 416 (1991-10-01), None
patent: WO 02 13958 (2002-02-01), None
patent: WO 02/013958 (2002-02-01), None
Webb, et al. in J. Mater. Res., vol. 10, No. 7. p. 1700 (1995) Synthetic diamond crystal strength enhancement through annealing at 50kbar and 1500C.
Anthony, Diamond & Related Materials. 8. 78-88 (1999) Inclusions in diamonds with solubility changes and phase transformations.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for reducing defect concentrations in crystals does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for reducing defect concentrations in crystals, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for reducing defect concentrations in crystals will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3861604

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.