Method for reducing contamination in semiconductor by selenium d

Single-crystal – oriented-crystal – and epitaxy growth processes; – Forming from vapor or gaseous state – With decomposition of a precursor

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117 2, 117928, C30B 2516

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active

056538014

ABSTRACT:
Contamination of aluminum-containing compound semiconductors is greatly reduced by an improved method for manufacturing the semiconductors, wherein the growing semiconductor crystal is doped with a predetermined concentration of selenium. The method of the present invention can be used to reduce contaminants in both p-type and n-type semiconductors.

REFERENCES:
patent: 2975048 (1961-03-01), Antell et al.
patent: 3297403 (1967-01-01), Haache
patent: 4606780 (1986-08-01), Leibenzender et al.
patent: 4855250 (1989-08-01), Yamamoto et al.
patent: 5108948 (1992-04-01), Murakami et al.
patent: 5182229 (1993-01-01), Arimoto
patent: 5183767 (1993-02-01), Baratte et al.
patent: 5387544 (1995-02-01), Hayafuji
"Properties of the Deep Donor States of Selenium Doped Aluminum Gallium Arsenide", Oh, E. G., et al.; J. Appl Phys. (1993), 72(2) pp. 1057-1071.
"Influence of Refilling Effects on Deep Level Transient Spectroscopy Measurements in Selenium Doped Aluminum Gallium Arsenide"; Enriquez, L. et al; J. Appl. Phys. (1992), 72(2), pp. 525-530.
"Transition Mechanisms of Two Interacting DX Centers in Type AlGaAs Using Reverse-Bias Deep Level Transient Spectroscopy and Temperature-Dependent Pulse-Width Reverse-Bias Deep Level Transient Spectroscopy Methods"; Wang, C. W. et al; J. Appl Phys. (15 Sep. 1993); vol. 74, No. 6, pp. 3921-3926.
"Effect of Se-Doping on Deep Impurities in AlxGa1-x As Grown by Metalorganic Chemical Vapor Deposition"; Chen, et al; J. of Elec Mat, vol. 24, No. 11, 1995, pp. 1677-1682.
"Reduction of Deep Level Impurities in Zn-Doped AlxGa1-xAs by a Co-Dopant Technique"; Chen, et al.; Jpn. J. Appl Phys. vol 34 (1995) pp. L476-L478.

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