Chemistry of inorganic compounds – Oxygen or compound thereof – Metal containing
Reexamination Certificate
2011-08-02
2011-08-02
Nguyen, Ngoc-Yen M (Department: 1734)
Chemistry of inorganic compounds
Oxygen or compound thereof
Metal containing
C423S069000, C423S492000
Reexamination Certificate
active
07988946
ABSTRACT:
The method allows ZrF4to be converted into ZrO2, by carrying out a thermal conversion operation based on solid ZrF4and water which are heated in a reactor until converted into ZrO2. The initial ratio by weight of ZrF4to water is in particular between 1/5 and 1/500, and this ratio is maintained substantially for the entire duration of the conversion. The thermal conversion is carried out at a temperature greater than or equal to 300° C. The invention is used in particular for recycling pickling baths for zirconium alloys.
REFERENCES:
patent: 5145720 (1992-09-01), Hirai et al.
patent: 5688477 (1997-11-01), Nel
patent: 5788935 (1998-08-01), Furic
patent: 2005/0161121 (2005-07-01), Qian et al.
patent: 0 723 038 (1996-07-01), None
patent: 815 425 (1959-06-01), None
C. B. Finch et al., Growth of Monoclinic Macrocrystalline ZrO2by Hydrolysis of ZrF4-LiF-NaF Melts at 650-800° C., J. Crys. Growth, 60 (1982), 321-324, Mar. 25, 2009.
Yokoyama et al.., Vapor Phase Growth of Stabilized Zirconia Crystals by Hydrolysis of Zirconium Fluoride, J. Of Crystal Growth, 78(2) : 418-20, 1986.
Search Report from French Patent Application No. : FR 0506697 mailed Apr. 5, 2006.
Chittaro Léonard
Lasalmonie David
Compagnie Europeenne du Zirconium-Cezus
Davidson Davidson & Kappel LLC
Nguyen Ngoc-Yen M
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