Method for recovering abrasive particles

Details Method for recovering abrasive particles Method for recovering abrasive particles

1995-10-12

1997-07-15

Fortuna, Ana

Liquid purification or separation

Processes

Liquid/liquid solvent or colloidal extraction or diffusing...

210650, 210651, 134 10, B01D 6100

Patent

active

056479891

ABSTRACT:
A method for recovering abrasive particles of, in particular, colloidal silica, in a simple manner from a spent abrasive suspension, which requires subjecting the spent abrasive slurry (5) containing colloidal silica used for polishing a semiconductor substrate in a microfilter (1) to thereby concentrate coarse particulate impurities for being removed out of the system, subjecting the slurry (6) which has permeated through the microfilter to an ultrafiltration in an ultrafilter (2) to concentrate the retained abrasive particles and recovering this concentrate in order to recover the colloidal silica.

REFERENCES:
patent: 4787980 (1988-11-01), Ackermann et al.
patent: 4879041 (1989-11-01), Kurokawa et al.
patent: 5061374 (1991-10-01), Lewis
patent: 5401400 (1995-03-01), Torielli et al.

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