Method for real-time control of the fabrication of a...

Data processing: generic control systems or specific application – Specific application – apparatus or process – Specific application of control based on elapsed time

Reexamination Certificate

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C700S028000, C700S046000, C700S121000, C356S369000

Reexamination Certificate

active

06868312

ABSTRACT:
Method for real-time control of the fabrication of a thin-film structure comprising a substrate by ellipsometric measurement in which:variables directly linked to the ellipsometric ratio ρ=tanΨ exp(iΔ) are measured; andthe said variables are compared with reference values. The comparison relates to the length of the path traveled at a time t in the plane of the variables with respect to an initial point at time t0, for each layer participating in the thin-film structure.

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Kildemo et al., “Real time control of the growth of silicon alloy multilayers by multiwavelength ellipsometry”; Thin Solid Films, Dec. 1996; vol. 290-291; pp. 46-50.*
M. Kildemo et al., “A direct robust feedback method for growth control of optical coatings by multiwavelength ellipsometry”; Thin Solid Films, Dec. 1998; vol. 313-314; pp. 484-489.*
Kildemo et al, “A direct robust feedback method for growth control of optical coatings by multiwavelength ellipsometry”;Thin Solid Films, vol. 313-314; Feb. 1998; pp. 484-489.
Kildemo et al, “Real time control of the growth of silicon alloy multilayers by multiwavelength ellipsometry”;Thin Solid Films; vol. 290-291; Dec. 1996; pp. 46-50.
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Search Report issued in French Application No. 00 10532.

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