Method for reactivating a residue containing elemental silicon

Details Method for reactivating a residue containing elemental silicon Method for reactivating a residue containing elemental silicon

1978-05-17

1980-09-23

Cooper, Jack

Chemistry of inorganic compounds

Silicon or compound thereof

Elemental silicon

252411R, 252416, C01B 3302, B01J 3700

Patent

active

042242975

ABSTRACT:
A method for utilizing a residue containing elemental silicon in the form of particles having a maximum diameter of 50 microns which comprises heating the residue for at least 15 hours at a temperature of from 100.degree. to 350.degree. C. in the presence of atmospheric air and/or an inert gas and thereafter recycling the treated residue into a process for preparing halosilanes.

REFERENCES:
patent: 2389931 (1945-11-01), Reed et al.
patent: 3645686 (1972-02-01), Tucker

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