Method for Raman imaging of semiconductor materials

Details Method for Raman imaging of semiconductor materials Method for Raman imaging of semiconductor materials

2006-10-17

2006-10-17

Lauchman, Layla G. (Department: 2877)

Optics: measuring and testing

By dispersed light spectroscopy

With raman type light scattering

C356S302000, C356S237400, C356S237500

Reexamination Certificate

active

07123358

ABSTRACT:
An ion implanted semiconductor surface is illuminated with a flood illumination of monochromatic radiation, and an image of the surface is taken using light which has been Raman scattered. The illumination and imaging system are calibrated by flood illuminating a uniformly Raman scattering surface.

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