Method for quartz bump defect repair with less substrate damage

Details Method for quartz bump defect repair with less substrate damage Method for quartz bump defect repair with less substrate damage

2007-12-18

2007-12-18

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C204S298360

Reexamination Certificate

active

10834895

ABSTRACT:
A method for minimizing damage to a substrate while repairing a defect in a phase shifting mask for an integrated circuit comprising locating a bump defect in a phase shifting mask, depositing a first layer of protective coating to an upper surface of the bump defect, depositing a second layer of protective coating to areas of the phase shifting mask adjacent the bump defect, etching the first layer of protective coating and removing the bump defect.

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patent: 2001/0027917 (2001-10-01), Ferranti et al.

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