Method for quantifying over-etch of a conductive feature

Details Method for quantifying over-etch of a conductive feature Method for quantifying over-etch of a conductive feature

2008-09-02

2008-09-02

Olsen, Allan (Department: 1792)

Etching a substrate: processes

Forming or treating electrical conductor article

Reexamination Certificate

active

11558995

ABSTRACT:
The invention provides a method for quantifying over-etch of a conductive feature. In one embodiment, this method includes forming a conductive feature over a substrate, the conductive feature having a sheet resistance test structure associated therewith, the sheet resistance test structure having a first sheet resistance value. This method may further include etching the conductive feature and the sheet resistance test structure using a common etch process, obtaining a second sheet resistance value of the sheet resistance test structure after the etching, and quantifying an amount of over-etch into the conductive feature using the first and second sheet resistance values.

REFERENCES:
patent: 4516071 (1985-05-01), Buehler
patent: 4560583 (1985-12-01), Moksvold
patent: 5390420 (1995-02-01), Schultz
patent: 6057171 (2000-05-01), Chou et al.
patent: 6087189 (2000-07-01), Huang
patent: 6291254 (2001-09-01), Chou et al.
patent: 6312963 (2001-11-01), Chou et al.
patent: 6403389 (2002-06-01), Chang et al.
patent: 6822260 (2004-11-01), Nariman et al.
patent: 6844751 (2005-01-01), Marshall et al.
patent: 6854100 (2005-02-01), Chuang et al.
patent: 2003/0229410 (2003-12-01), Smith et al.
patent: 2005/0132306 (2005-06-01), Smith et al.
patent: 2005/0242870 (2005-11-01), Aota
patent: 2006/0255825 (2006-11-01), Smayling et al.
patent: 2007/0145998 (2007-06-01), Smayling et al.

Affiliated with

Also associated with

Rating

Method for quantifying over-etch of a conductive feature does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for quantifying over-etch of a conductive feature, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for quantifying over-etch of a conductive feature will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3912174