Method for pyrolytically coating glass, glass ceramic and enamel

Glass manufacturing – Processes – With coating

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65 605, 65 6052, 65 608, 427160, 427165, 427168, C03C 1700

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active

057727163

ABSTRACT:
Electrically conductive and infrared-reflecting tin oxide layers with a reduced optical irisation intensity on glass, glass ceramic and enamel are produced in that initially a solution of boron, silicon, tin and optionally phosphorus compounds in water and/or organic solvents is applied and converted pyrolytically into a layer of oxides of these elements, the refractive index of which lies between that of the substrate to be coated and that of the tin oxide layer and on this layer, a tin oxide layer is applied pyrolytically in a known manner.

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LPCVD of Borophosphosilicate Glass from Organic Reactants, by D.S. Williams (AT&T Bell Laboratories, Murray Hill, New Jersey 07974) and E.A. Dein (AT&T Bell Laboratories, Allentown, Pennsylvania 18103), J. Electrochem Soc.: Solid-State Science and Technology, 134, No.3 (Mar. 1987), 657-664.
Low Pressure Deposition of Doped SiO.sub.2 by Pyrolysis of Tetraethylorthosilicate (TEOS), I. Boron and Phosphorus Doped Films, by F.S. Becker *Siemens AG, Company Project MEGA in Germany) and S. Rohl (Siemens AG, Microelectronics Technology Center in Germany), J. Electrochem Soc.: Solid-State Science and Technology, 134, No. 11(Nov. 1987), 2923-2931.
The LPCVD of Silicon Oxide Films below 400.degree. C. from Liquid Sources, by A.K.Hochberg and D.L. O/Meara (J.C. Schumacher Company, Carlsbad, California 92009), J. Electrochem. Soc., 136, No. 6 (Jun. 1989), 1843 + 1844.

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