Method for pyrolxtically forming a silicon oxide coating on a ho

Glass manufacturing – Processes – With coating

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65 6051, 65 6052, 65 6080, C03C 2502

Patent

active

050890395

ABSTRACT:
A method of pyrolytically forming a silicon oxide coating on a hot glass substrate as it travels past a coating chamber includes contacting the substrate with silane-containing coating precursor material in the presence of oxygen. The silane-containing coating precursor material is in the vapor phase and it and gaseous oxygen are intimately mixed before they enter the coating chamber to contact the substrate. Silane as coating precursor material may be conveyed towards the coating chamber in vapor phase in a substantially inert carrier gas stream and oxygen introduced into the silane-containing carrier gas stream before it enters the coating chamber. The coating operation may take place within a coating chamber within a float chamber in which the glass is formed into ribbon.

REFERENCES:
patent: 3923484 (1975-12-01), Randall
patent: 4411678 (1983-10-01), Arai
patent: 4469045 (1984-09-01), Chesworth
patent: 4828880 (1989-05-01), Jenkins et al.
patent: 4910088 (1990-03-01), Baudin et al.
Refractories, Ceramics, "Thermal Radiation Reflection in Glass Improved by Coating Glass with Thermally-Decomposable Cpd. During Float-Extrusion"; Asahi Glass KK.; Dec. 7, 1972; p. 1 (36455W/22*J4 9080-120).

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