Organic compounds -- part of the class 532-570 series – Organic compounds – Oxygen containing
Patent
1994-01-27
1995-05-16
Evans, Joseph E.
Organic compounds -- part of the class 532-570 series
Organic compounds
Oxygen containing
568620, C07C 4134
Patent
active
054162416
ABSTRACT:
A method for purifying polyether polyols made with double metal cyanide (DMC) catalysts is disclosed. A poly(oxypropylene) polyol containing DMC catalyst residues is combined with an amount of an alkali metal compound sufficient to convert DMC residues to an insoluble species, but not sufficient to generate polyol alkoxide groups. The polyol is heated in the presence of water, and is then filtered and stripped. The method eliminates the need to use magnesium silicate in removing DMC catalysts from polyols.
REFERENCES:
patent: 3278457 (1966-10-01), Milgrom
patent: 3829505 (1974-08-01), Herold
patent: 4355188 (1982-10-01), Herold et al.
patent: 4721818 (1988-01-01), Harper et al.
patent: 4877906 (1989-10-01), Harper
patent: 4987271 (1991-01-01), Watabe et al.
patent: 4994627 (1991-02-01), Cuscurida et al.
patent: 5010047 (1991-04-01), Schuchardt
patent: 5012013 (1991-04-01), Wimmer et al.
patent: 5099075 (1992-03-01), Katz et al.
patent: 5144093 (1992-09-01), Reisch et al.
patent: 5235114 (1993-08-01), Reisch et al.
patent: 5248883 (1993-09-01), Hinney et al.
patent: 5266681 (1995-11-01), Reisch et al.
J. L. Schuchardt & S. d. Harper, "Proceedings of the SPI:32nd Annual Technical/Marketing Conference", Oct. 1989, pp. 360-364.
Arco Chemical Technology L.P.
Evans Joseph E.
Schuchardt Jonathan L.
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