Method for purifying high-temperature reducing gas

Details Method for purifying high-temperature reducing gas Method for purifying high-temperature reducing gas

1987-04-23

1991-02-19

Russel, Jeffrey E.

Chemistry of inorganic compounds

Sulfur or compound thereof

Elemental sulfur

423230, 423231, B01D 5304, C01B 1706

Patent

active

049942573

ABSTRACT:
The present invention is directed to a method for purifying a high-temperature reducing gas by continuously circulating the processes of reducing a regenerated absorbent with the high-temperature reducing gas, until concentrations of aimed reducing gases have become uniform on upstream and downstream sides of the absorbent, and absorbing sulfur compounds by the use of this absorbent and thereby removing these sulfur compounds therefrom; the aforesaid method being characterized by using at least three reactors filled with the absorbent, by consisting of the four steps of reduction, absorption, SO.sub.2 reduction and regeneration, and by comprising the steps of feeding a circulating gas from the regenerating step to the SO.sub.2 reducing step; converting an SO.sub.2 gas produced in the regenerating step and the SO.sub.2 reducing step into elemental sulfur and recovering the latter as liquid sulfur; and introducing a part of the SO.sub.2 gas into the reducing step and returning the remaining SO.sub.2 gas to the regenerating step.

REFERENCES:
patent: 1822293 (1931-09-01), Joseph
patent: 1971815 (1934-08-01), Halvorsen
patent: 2747968 (1956-05-01), Pigache
patent: 4533529 (1985-08-01), Lee

Affiliated with

Also associated with

Rating

Method for purifying high-temperature reducing gas does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for purifying high-temperature reducing gas, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for purifying high-temperature reducing gas will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1142169