Gas separation: processes – Solid sorption – Inorganic gas or liquid particle sorbed
Reexamination Certificate
2006-09-05
2006-09-05
Lawrence, Frank M. (Department: 1724)
Gas separation: processes
Solid sorption
Inorganic gas or liquid particle sorbed
C095S129000, C095S137000
Reexamination Certificate
active
07101416
ABSTRACT:
A method and composition for the removal of contaminants in a gas stream used in the contamination sensitive processes of photolithography and metrology are described. The synergistic effect of a combination of an electropositive metal component, a high silica zeolite, and a late transition metal compound effects removal or reduction of the contaminates in the gas which interfere with light transmittance to the ppb or ppt levels necessary for the gas to be suitable for these uses. The removal of neutral polar molecules, neutral polar aprotic molecules, protic and aprotic alkaline molecules, acidic polar species, and neutral non-polar aprotic molecules is accomplished with the claimed composition. Depending on the type of contaminant, the composition components are each varied from 10 to 80 parts by volume, with the total composition limited to 100 parts by volume.
REFERENCES:
patent: 4663300 (1987-05-01), Lester et al.
patent: 4735927 (1988-04-01), Gerdes et al.
patent: 4798813 (1989-01-01), Kato et al.
patent: 4855276 (1989-08-01), Osborne et al.
patent: 4869735 (1989-09-01), Miyazawa et al.
patent: 5171422 (1992-12-01), Kirker et al.
patent: 5328672 (1994-07-01), Montreuil et al.
patent: 5430000 (1995-07-01), Timken
patent: 5607647 (1997-03-01), Kinkead
patent: 5685895 (1997-11-01), Hagiwara et al.
patent: 5910292 (1999-06-01), Alvarez, Jr. et al.
patent: 6059859 (2000-05-01), Alvarez, Jr. et al.
patent: 6103206 (2000-08-01), Taylor, Jr. et al.
patent: 6114268 (2000-09-01), Wu et al.
patent: 6391090 (2002-05-01), Alvarez et al.
patent: 6511528 (2003-01-01), Lansbarkis et al.
patent: 6555492 (2003-04-01), Faber et al.
patent: 6569394 (2003-05-01), Fischer et al.
patent: 6576587 (2003-06-01), Labarge et al.
patent: 6645898 (2003-11-01), Alvarez, Jr. et al.
patent: WO 88/02659 (1988-04-01), None
Dallas, Andrew J., et al., “Protecting the DUV Process and Optimizing Optical Transmission”,Meterology, Inspection, and Process Control for Microlithography XIV, Neal T. Sullivan, Editor, Proceedings of SPIE, vol. 3998, pp. 863-874, (2000).
Holmes, S. J., et al., “Manufacturing with DUV Lithography”,IBM Journal of Research and Development, vol. 41, Optical Lithography, (1997).
Kishkovich, Oleg, et al., “Real-Time Methodologies for Monitoring Airborne Molecular Contamination in Modern DUV Photolithography Facilities”,SPIE Conference on Meterology, Inspection, and Process Control in Microlithography XIII, vol. 3677, pp. 348-376, (Mar. 1999).
Koshkovich, Oleg, et al., “An Accelerated Testing Technique for Evaluating Performance of Chemical Air Filters for DUV Photolithographic Equipment”,SPIE Conference on Meterology, Inspection, and Process Control in Microlithography XIII, vol. 3677, pp. 857-865, (Mar. 1999).
MacDonald, Scott A., et al., “Airborne Contamination of a Chemically Amplified Resist 1 Identification of Problem”,Chem. Mater, vol. 5, pp. 348-356, (1993).
Zhu, Sheng-Bai, “Contamination Control During Sh8pp8ng, Handling and Storage of Reticles”,Meterology, Inspection, and Process Control for Microlithography XIV, Neal T. Sullivan, Editor, Proceedings of SPIE, vol. 3998, pp. 565-572, (2000).
Ullmans' Encyclopedia of Industrial Chemistry, Completely Revised Fifth Edition, Editors Barbara Elvers and Stephen Hawkins, vol. 28A, pp. 475-490, (1985).
Kirk-Othmer Encyclopedia of Chemical Technology, Third Edition, vol. 15, pp. 639-655, 1339-1369, (1978).
Alvarez, Jr. Daniel
Spiegelman Jeffrey J.
Hamilton Brook Smith & Reynolds P.C.
Lawrence Frank M.
Mykrolis Corporation
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