Method for purification of disilicon hexachloride and high...

Details Method for purification of disilicon hexachloride and high... Method for purification of disilicon hexachloride and high...

2006-03-17

2010-06-22

Lorengo, Jerry (Department: 1793)

Chemistry of inorganic compounds

Silicon or compound thereof

Halogen containing

C423S341000, C203S041000

Reexamination Certificate

active

07740822

ABSTRACT:
The objective of the present invention is to provide a method for obtaining a high purity disilicon hexachloride by removing a silanol with good efficiency from a disilicon hexachloride material containing the silanol as an impurity. The purification method for disilicon hexachloride of the present invention comprises a process for contacting a disilicon hexachloride material containing disilicon hexachloride and a silanol as an impurity with an adsorbent material such as activated carbon to remove the silanol. The method may further comprise a distillation process. The above processes are preferably performed in an atmosphere of an inert gas.

REFERENCES:
patent: 2004/0096582 (2004-05-01), Wang et al.
patent: 2006/0118723 (2006-06-01), Kimata
patent: 1 264 798 (2002-12-01), None
patent: 923784 (1963-04-01), None
patent: 61-275125 (1986-12-01), None
patent: 2-153815 (1990-06-01), None
patent: WO 02/12122 (2002-02-01), None
patent: WO 2004/015401 (2005-02-01), None

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