Method for pure ion plating using magnetic fields

Details Method for pure ion plating using magnetic fields Method for pure ion plating using magnetic fields

1983-04-22

1983-12-13

Demers, Arthur P.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

204192R, 204298, 427 39, 427 50, C23C 1500

Patent

active

044203861

ABSTRACT:
A method for ion plating a substrate (b 40) within a chamber (52) with a plating material (20) is provided. The method includes evacuating the chamber (52) and vaporizing the plating material (20) within the evacuated chamber (52). An electron saturated magnetic field (30) is placed adjacent the substrate (40) for positive ionization of the evaporant atoms of the vaporized plating material (20). A negative bias (61, 62) is applied to the substrate (40) for attracting positive ions of the vaporized plating material (20).

REFERENCES:
patent: Re30401 (1980-09-01), White
patent: 3329601 (1967-07-01), Mattox
patent: 3913520 (1975-10-01), Berg et al.
patent: 3974059 (1976-08-01), Murayama
patent: 4016389 (1977-04-01), White
patent: 4039416 (1977-08-01), White
patent: 4094764 (1978-06-01), Boucher et al.
patent: 4107350 (1978-08-01), Berg et al.
patent: 4116791 (1978-09-01), Zega
patent: 4210701 (1980-07-01), Berg et al.
patent: 4342631 (1982-08-01), White et al.
"A Study of Vacuum Deposition Techniques", White, Gerald W. Appliance Engineer, Apr. 1981, 51-54.

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