Method for pumping impurities, especially noble gases, from hydr

Details Method for pumping impurities, especially noble gases, from hydr Method for pumping impurities, especially noble gases, from hydr

1980-05-02

1982-05-04

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

204298, 252630, C23C 1500, G21F 902

Patent

active

043280790

ABSTRACT:
A method and apparatus which uses sputter cathode material in an ion sputter pump to discriminate between hydrogen or its isotopes and the pumped impurities by virtue of their different permeability or diffusion rates through and solubility in a film of sputtered cathode material. Iron and specific hydride-forming cathode materials are examples.

REFERENCES:
patent: 4051063 (1977-09-01), Nelson et al.
patent: 4094762 (1978-06-01), Clelland
M. A. Bayne et al., "Krypton Entrapment in Pulse-Biased Sputter-Deposited Metals", Thin Solid Films, vol. 54, pp. 327-336 (1978).

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