Single-crystal – oriented-crystal – and epitaxy growth processes; – Processes of growth from liquid or supercritical state – Having pulling during growth
Patent
1998-03-31
2000-05-02
Garrett, Felisa
Single-crystal, oriented-crystal, and epitaxy growth processes;
Processes of growth from liquid or supercritical state
Having pulling during growth
117 15, 117 20, 117201, 117202, C30B 1526
Patent
active
060568194
ABSTRACT:
In the pulling of a single crystal, hitherto, it is difficult to reduce the OSF density while the deformation rate is held down within the tolerance, so that it is difficult to improve the quality and productivity. In the present invention, a deviation from a true circle in each part of a single crystal S.sub.n-1 which was pulled in the preceding batch is found and the pulling speed pattern f.sub.pn-1 (L.sub.1) in the preceding batch is updated (f.sub.pn (L.sub.1)) before a single crystal S.sub.n is pulled, in order to pull the single crystal as fast as possible so that the OSF density is small while the deviation is within the tolerance.
REFERENCES:
patent: 5240684 (1993-08-01), Baba et al.
patent: 5437242 (1995-08-01), Hofstetter et al.
patent: 5584930 (1996-12-01), Katsuoka et al.
patent: 5660629 (1997-08-01), Shiraishi et al.
patent: 5665159 (1997-09-01), Fueroff
Kashiwara Yoshiyuki
Maeda Tokuji
Ogawa Masahiro
Yamamoto Toshiyuki
Garrett Felisa
Sumitomo Metal Industries Ltd.
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