Method for providing representative features for use in...

Details Method for providing representative features for use in... Method for providing representative features for use in...

2007-07-10

2007-07-10

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S022000

Reexamination Certificate

active

10702527

ABSTRACT:
Critically representative features (CRF's) for use in mask-making verification and/or resist development verification are defined and/or copied into the in-scribe area used by wafer CD features. The placement of mask-CRF's in the wafer CD bar region eliminates the problem of correctly and quickly locating mask-CRF's at different positions in the in-die areas of a manufactured mask. On-wafer counterparts of the mask-CRF's may be used for fine-tuning lithography and patterning processes.

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