Method for providing flexible and dynamic reporting...

Details Method for providing flexible and dynamic reporting... Method for providing flexible and dynamic reporting...

2006-08-01

2006-08-01

Rodriguez, Paul L. (Department: 2123)

Data processing: structural design, modeling, simulation, and em

Simulating electronic device or electrical system

C703S014000, C703S001000, C716S030000, C716S030000

Reexamination Certificate

active

07085698

ABSTRACT:
A method of generating simulation reports regarding an integrated circuit layout is provided. The method can include providing a plurality of control points associated with the integrated circuit layout. A single simulation of the plurality of control points can be performed. Detailed information from the single simulation can be stored in a database. Desired information can then be extracted from the database to generate the simulation reports.

REFERENCES:
patent: 5694481 (1997-12-01), Lam et al.
patent: 5801954 (1998-09-01), Le et al.
patent: 5838583 (1998-11-01), Varadarajan et al.
patent: 5974243 (1999-10-01), Moh et al.
patent: 6045584 (2000-04-01), Benzel et al.
patent: 6077307 (2000-06-01), Benzel et al.
patent: 6081659 (2000-06-01), Garza et al.
patent: 6115546 (2000-09-01), Chevallier et al.
patent: 6263301 (2001-07-01), Cox et al.
patent: 6301689 (2001-10-01), Darden
patent: 6370679 (2002-04-01), Chang et al.
patent: 6415421 (2002-07-01), Anderson et al.
patent: 6425113 (2002-07-01), Anderson et al.
patent: 6467076 (2002-10-01), Cobb
patent: 6470489 (2002-10-01), Chang et al.
patent: 6523162 (2003-02-01), Agrawal et al.
patent: 6560766 (2003-05-01), Pierrat et al.
patent: 6578188 (2003-06-01), Pang et al.
patent: 6584609 (2003-06-01), Pierrat et al.
patent: 6637013 (2003-10-01), Li
patent: 6757645 (2004-06-01), Chang et al.
patent: 2003/0061583 (2003-03-01), Malhotra
patent: WO 99/14638 (1999-03-01), None
patent: WO 00/67075 (2000-11-01), None
patent: WO 00/67076 (2000-11-01), None
Lavenir, “Lavenir CAM Software User's Guide”, 1999, pp. 115-130, 385-412.
A.B. Kahng and Y.C. Pati, “Subwavelength Optical Lithography: Challenges and Impact on Physical Design”, 1999, ACM, pp. 112-119.
E. Sahouria, Y. Granik, N. Cobb, and O. Toublan; “Full-chip Process Simulation for Silicon DRC”; 2000, MSM 2000, pp. 1-4.
Frank M Schellenberg, “Resolution Enhancement with OPC/PSM”, Jan. 2000, pp. 1-16.
Cai, L., et al., “Enhanced Dispositioning of Reticle Defects Using the Virtual Stepper with Automated Defect Severity Scoring”, Numerical Technologies, Inc., Advanced Micro Devices. Inc., pp. 1-12.
Ronsc. K., et al., “Thin Film Interference Effects in Phase Shifting Masks Causing Phase and Transmittance Errors”, IMEC (15 pages).
Casey, Jr., J.D., et al., “Chemically Enhanced FIB Repair of Opaque Defects on Molybdenum Silicide Photomasks”, SPIE, vol. 3236, pp. 487-497 (1997).
Henke, W., et al., “A Study of Reticle Defects Imaged Into Three-Dimensional Developed Profiles of Positive Photoresist Using the Solid Lithography Simulator”, Microelectronics Eng., vol. 14, pp. 283-297 (1991).
Ham, Y.M., et al., “Dependence of Defects in Optical Lithography”, Jpn. J. Appl. Phys., vol. 31, pp. 4137-4142 (1992).
Watanabe, H., et al., “Detection and Printability of Shifter Defects in Phase-Shifting Masks II Defocus Characteristics”, Jpn. J. Appl. Phys., vol. 31, pp. 4155-4160 (1992).
Nistler, J., et al., “Phase Shift Mask Defect Printability Analysis”, Proceedings Of The Microlithography Seminar INTERFACE '93. OCG Microelectronic Materials, Inc., pp. 11-28 (1993).
Spence, C., et al., “Automated Determination of CAD Layout Failures Through Focus: Experiment and Simulation”, SPIE, vol. 2197, pp. 302-313 (1994).
Karklin, L., “A Comprehensive Simulation Study of the Photomask Defects Printability”, SPIE, vol. 2621. pp. 490-504 (1995).
Gans, F., et al., “Printability and Repair Techniques for DUV Photomasks”, SPIE, Proceedings Of The 17th Annual Symposium On Photomask Technology And Management, vol. 3236. pp. 136-141 (1997).
Ibsen, K., et al., “Clear Field Reticle Defect Diposition for Advanced Sub-Half Micron Lithography”, SPIE, Proceedings Of The 17th Annual Symposium on Photomask Technology And Management. vol. 3236, pp. 124-135 (1997).
Tsujimoto, E., et al., “Hierarchical Mask Data Design System (PROPHET) for Aerial Image Simulation, Automatic Phase-Shifter Placement, and Subpeak Overlap Checking”, SPIE, vol. 3096, pp. 163-172 (1997).
Gordon, R., et al., “Design and Analysis of Manufacturable Alternating Phase-Shifting Masks”, Bacus News, vol. 14, Issue 12, pp. 1-9, Dec. 1998.
Chen, et al., “ArF (193nm) Alternating PSM Quartz Defect Repair and Printability for 100nm Node”, BACUS Photomask Technology, Sep. 21, 2001 (20 pages).

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