Method for providing a resistive lens structure for an electron

Electric lamp or space discharge component or device manufacturi – Process – With assembly or disassembly

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29620, 427101, 4271262, 4271265, B05D 512

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active

060482443

ABSTRACT:
A method for providing a resistive focusing lens structure for an electron beam device including forming a suspension of particles of a mixture of, by weight, of about 33-50% of an oxidic conductive material including about 40-60% of a lead ruthenate, about 25-38% of a lead titanate and about 2-15% of a ruthenium oxide, and of about 50-67% of a glass including about 30-40% of silicon dioxide (SiO.sub.2), about 3-7.5% alumina (Al.sub.2 O.sub.3), and about 53-67% of lead oxide (PbO) in a suspending medium consisting essentially of a non-acidic liquid having a boiling point of less than 150.degree. C., applying the suspension to an inside surface of a glass member to thereby provide a coating of the particles on the inside surface, firing the coating at a temperature of 700-900.degree. C. and before of after firing the coating, patterning the coating. The present method provides highly reproducible resistive focusing lens structures.

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patent: 4827184 (1989-05-01), Spanjer et al.
patent: 4853589 (1989-08-01), Vrijssen et al.
patent: 4857797 (1989-08-01), Vrijssen et al.
patent: 5510670 (1996-04-01), Osborne et al.

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