Etching a substrate: processes – Forming or treating article containing magnetically...
Reexamination Certificate
2007-05-01
2007-05-01
Hassanzadeh, Parviz (Department: 1763)
Etching a substrate: processes
Forming or treating article containing magnetically...
Reexamination Certificate
active
10633765
ABSTRACT:
A method for providing a liftoff process using a single layer resist and chemical mechanical polishing and sensor formed therewith are disclosed. Chemical mechanical polishing is combined with liftoff using only a single resist layer to allow the removal of leftover fencing on the side of a lifted resist pattern.
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Cyrille Marie-Claire
Lee Kim Y.
Li Jui-Lung
Wang Chun-Ming
Chambliss Bahner & Stophel P.C.
Culbert Roberts
Hassanzadeh Parviz
Hitachi Global Storage Technologies - Netherlands B.V.
Lynch David W.
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