Etching a substrate: processes – Forming or treating article containing magnetically...
Reexamination Certificate
2006-07-11
2006-07-11
Ahmed, Shamim (Department: 1765)
Etching a substrate: processes
Forming or treating article containing magnetically...
C216S041000, C029S603100, C029S603180, C430S313000, C264S293000
Reexamination Certificate
active
07074341
ABSTRACT:
A method of manufacturing a stamper/imprinter for use in patterning of a recording medium comprising the sequential steps of providing a substrate/workpiece comprising a topographical pattern formed in a portion of a surface of the substrate/workpiece. The pattern defines a periphery. An alignment mark is formed in another portion of the surface of surrounding the periphery. An opaque protective film is formed overlying the entirety of the surface. A peripheral portion of the protective film is removed to expose the alignment mark. Selected portions of the substrate/workpiece are removed while the alignment mark is utilized for accurate alignment during the removal process. Remaining portions of the protective film are removed prior to use.
REFERENCES:
patent: 5991104 (1999-11-01), Bonyhard
patent: 6638692 (2003-10-01), Banal et al.
patent: 6869557 (2005-03-01), Wago et al.
patent: 2003/0133114 (2003-07-01), Hickman
Formato Christopher J.
Kurataka Nobuo
Wang Hong Ying
Ahmed Shamim
Seagate Technology LLC
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