Method for protecting a substrate surface from contamination usi

Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...

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134 2, 134 21, 134902, B08B 700

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active

053665597

ABSTRACT:
A method for processing a substrate surface in a process chamber wherein during chemical or physical altering of the substrate surface a laser beam is projected inside the processing chamber and along a trajectory which does not contact the substrate surface in order to capture particles by means of the photophoretic effect, particles which would otherwise impinge upon and contaminate the substrate surface.

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