Method for projecting and exposing a photomask pattern onto re-e

Details Method for projecting and exposing a photomask pattern onto re-e Method for projecting and exposing a photomask pattern onto re-e

1986-03-14

1988-03-29

Wintercorn, Richard A.

Photocopying

Projection printing and copying cameras

With focusing or projection screen

355 43, 355 53, G03B 2752, G03B 2770

Patent

active

047347457

ABSTRACT:
A method and an apparatus for projecting and exposing a photomask pattern of a master mask onto a plurality of re-exposing substrates using first and second pluralities of positioning markers, marked on the master mask and a standard marker substrate, respectively, and a condensing optical system for optically aligning the mounting positions of the master mask and the re-exposing substrate and exposing the photomask pattern onto the re-exposing substrate, where the master mask and the re-exposing substrate are placed at the conjugate points of the condensing optical system. In an embodiment in which the focus length of the condensing optical system is long, the standard marker substrate is fixed in close proximity to the re-exposing substrate on the optical axis of the condensing optical system to produce a shadow image of the second positioning markers on the re-exposing substrate. In a second embodiment, in which the focus length of the condensing optical system may be long or short, the condensing optical system is separated into two condensing optical parts which are optically connected in series at a optically relaying node, and the standard marker substrate is positioned at the optically relaying node.

REFERENCES:
patent: 4452526 (1984-06-01), Johannsmeier et al.
patent: 4577958 (1986-03-01), Phillips
patent: 4620785 (1986-11-01), Suzuki et al.
Solid State Technology, vol. 26, No. 5, May 1983, "Application of Automatic Alignment to MOS Processing in Projection Printing", Berry et al., pp. 87-91.

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