Wells – Processes – Separate steps of fracturing or attacking formation
Patent
1983-01-24
1984-10-09
Suchfield, George A.
Wells
Processes
Separate steps of fracturing or attacking formation
166295, E21B 33138
Patent
active
044755937
ABSTRACT:
Methods are provided for selectively placing a barrier to fluid flow within water rich strata or played out strata of a subterranean formation, the barrier being established at some distance remote from a wellbore. The methods involve first washing a desired volume of formation with an acid solution such as HCl. The acid solution is effective to extract and remove polyvalent metal ions from the formation material. Next an acidified resin emulsion composition comprising an oil soluble, acid stable resin is injected into the formation. The resin emulsion traverses the washed region without plugging. When the resin reaches the outer edge of the washed region the acidified emulsion extracts metal ions adsorbed to the unwashed formation material. The extracted polyvalent metal ions are effective to demulsify and coalesce the resin, thereby establishing a relatively impermeable barrier to subsequent fluid flow.
The methods of this invention have application in a wide variety of profile control techniques for effecting conformance or sweep efficiency in oil bearing subterranean formations.
REFERENCES:
patent: 2294078 (1942-08-01), Dow et al.
patent: 2842338 (1958-07-01), Davis et al.
patent: 3635289 (1972-01-01), Van Dyr
patent: 3721295 (1973-03-01), Bott
patent: 3724551 (1973-04-01), Troscinski et al.
patent: 3749174 (1973-07-01), Friedman et al.
patent: 3811508 (1974-05-01), Friedman
patent: 3865189 (1975-02-01), Friedman
patent: 3866684 (1975-02-01), Friedman
patent: 3866685 (1975-02-01), Friedman
patent: 3876438 (1975-04-01), Friedman et al.
patent: 3893510 (1975-07-01), Elphingstone et al.
patent: 4328864 (1982-05-01), Friedman
patent: 4352396 (1982-10-01), Friedman
Getty Oil Company
Suchfield George A.
LandOfFree
Method for profile control and conformance correction does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for profile control and conformance correction, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for profile control and conformance correction will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1595358