Method for production of X-ray-transparent membrane

Details Method for production of X-ray-transparent membrane Method for production of X-ray-transparent membrane

1987-09-18

1989-04-11

Pianalto, Bernard

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

B05D 306

Patent

active

048205460

ABSTRACT:
A membrane of the present invention used for a mask for X-ray exposure is made of an amorphous of boron nitride carbide hydrogenated, containing 1 to 10 atomic percent of carbon. This membrane is made in a plasma CVD, whose source gases are ammonia, diborane and methane diluted in argon gas. The flow rate ratio of the ammonia to the diborane is 0.6 to 1.55, the deposition temperature is 350.degree. to 500.degree. C., the gas pressure is 60 to 250 Pa, the applied RF power is 0.1 to 0.17 W/cm.sup.2. Thus formed membrane is adequately transparent to a visible light and the X-ray used for mask alignment, while keeping the stiffness enough and the residual stress properly tensile.

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