Plastic and nonmetallic article shaping or treating: processes – Pore forming in situ – By mechanically introducing gas into material
Patent
1985-03-26
1987-09-15
Derrington, James
Plastic and nonmetallic article shaping or treating: processes
Pore forming in situ
By mechanically introducing gas into material
264 86, 501 97, 501 98, C04B 3332
Patent
active
046938575
ABSTRACT:
As the aluminum nitride component of a sintering aid for powdered silicon nitride, either a spinel type compound having oxygen dissolved in aluminum nitride to form a solid solution or a poly-type aluminum nitride is used. Since the compound is highly stable in water, it can be effectively used in the form of an aqueous slurry mixture. As the sintering aid, this compound is used as effectively as aluminum nitride.
REFERENCES:
patent: 4113503 (1978-09-01), Lumby et al.
patent: 4147759 (1979-04-01), Demit
patent: 4496503 (1985-01-01), Ezis et al.
Sakai et al., Yogyo Kyokai-shi 86[3], 1978, pp. 125-130.
Sakai et al., Yogyo-Kyoaki 86[3], 1978, pp. 174-179.
McCauley et al., "High Temperature Reactions and Microstructures in the Al.sub.2 O.sub.3 -AlN System," Nitrogen Ceramics, pp. 111-118 (1983).
Chemical Abstracts, vol. 101, No. 2, Jul. 1984, p. 252, No. 11476q.
Chemical Abstracts, vol. 100, No. 14, Apr. 1984, p. 286, No. 108058x.
Lewis, M. H. and Lumby, R. J., "Nitrogen Ceramics: Liquid Phase Sintering," Powder Metallurgy, vol. 26, No. 2 (London, 1983).
Cother, N. E. and Hodgson, D., 81 Trans, J. Br. Ceram. Soc., pp. 141-144 (Codridge, Stoke-on-Trent, 1982).
Komatsu Michiyasu
Komeya Katsutoshi
Derrington James
Kabushiki Kaisha Toshiba
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