Method for production of photosensitive material for diffusion t

Radiation imagery chemistry: process – composition – or product th – Transfer procedure between image and image layer – image... – Diffusion transfer process – element – or identified image...

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430227, 430230, 430244, 430234, G03C 554

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active

050494759

ABSTRACT:
A photosensitive material for diffusion transfer process is disclosed according to which characteristic such as high maximum density, high contrast and image reproducibility can be stably obtained. This photosensitive material comprises a support and, provided thereon, a silver halide emulsion layer and a hydrophilic colloid layer and which is processed in contact with an image receiving material in a processing solution for silver complex diffusion transfer process wherein at least one of the silver halide emulsion layer and the hydrophillic colloid layer permeable to water contains a hydroxybenzene developing agent; when the layers on the emulsion layer coated side are immersed in a 0.1N aqueous sodium hydroxide solution at 20.degree. C. for 1 minute, amount of solution absorbed in the layers is 3.5-7.0 ml per 1 g of hydrophilic colloid; and the support comprises a paper coated with polyolefin resin on both sides and has a water content of 5.5%-7.5%.

REFERENCES:
patent: 2834676 (1958-05-01), Stanley et al.
patent: 2962377 (1960-11-01), Land
patent: 3300306 (1967-01-01), Sevens et al.
patent: 4302526 (1981-11-01), Kohmura et al.
patent: 4562140 (1985-12-01), Kohmura et al.
patent: 4606985 (1986-08-01), Takaya et al.
patent: 4632896 (1986-12-01), Tsabai et al.
patent: 4743525 (1988-05-01), Yamamoto et al.
patent: 4824760 (1989-04-01), Yamamoto et al.
patent: 4873170 (1989-10-01), Nishinoiri et al.

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