Method for production of electron source substrate provided...

Coating processes – Electrical product produced – Electron emissive or suppressive

Reexamination Certificate

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C427S078000

Reexamination Certificate

active

07442405

ABSTRACT:
A novel process for producing an electron source substrate is disclosed for formation of electron-emitting element at high efficiency with less shape irregularity. In the process, the region for electroconductive film formation is divided into plural subregions on which an electroconductive film is formed respectively. In forming the electroconductive film by application of plural liquids, the time interval between the application of the two drops is controlled to be larger than the time length necessary for suppressing the spreading of the succeedingly applied liquid within an allowable limit.

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