Active solid-state devices (e.g. – transistors – solid-state diode – Incoherent light emitter structure – With reflector – opaque mask – or optical element integral...
Reexamination Certificate
2011-04-12
2011-04-12
Richards, N Drew (Department: 2895)
Active solid-state devices (e.g., transistors, solid-state diode
Incoherent light emitter structure
With reflector, opaque mask, or optical element integral...
C257S099000
Reexamination Certificate
active
07923742
ABSTRACT:
A nitride semiconductor laminated structure comprises: a substrate; a first p-type nitride semiconductor layer formed using an organometallic compound as a Group III element source material, a p-type impurity source material, and ammonia as a Group V element source material, with the hydrogen concentration in the first p-type nitride semiconductor layer being 1×1019cm−3or less; and a second p-type nitride semiconductor layer on the first p-type nitride semiconductor layer formed using an organometallic compound as a Group III element source material, a p-type impurity source material, and ammonia and a hydrazine derivative as Group V element source materials, with the carbon concentration in the second p-type nitride semiconductor layer being 1×1018cm−3or less.
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Ohno Akihito
Takemi Masayoshi
Tomita Nobuyuki
Carpenter Robert
Leydig , Voit & Mayer, Ltd.
Mitsubishi Electric Corporation
Richards N Drew
LandOfFree
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