Method for producing width-modulated surface relief patterns

Details Method for producing width-modulated surface relief patterns Method for producing width-modulated surface relief patterns

1974-05-22

1976-03-23

Kimlin, Edward C.

Gas separation: apparatus

Electric field separation apparatus

With means to add charged solid or liquid particles to...

96 36, 96 383, 156 8, 156 15, 156 18, 350 35, G03C 504, G02B 300

Patent

active

039458253

ABSTRACT:
Pulse width modulated surface relief phase holograms are produced on a substrate by developing a holographic interference pattern recorded on a photoresist deposited on the surface of said substrate as an amplitude modulated sinusoidal surface relief pattern so as to expose the surface of said substrate as a function of the intensity of said interference pattern, uniformly etching said substrate and removing said photoresist leaving a pulse width modulated, substantially two-level rectangular wave diffraction grating. Focused image holograms produced by this method on hard durable substrates may be used as masters for replicating said holograms in a suitable recording medium.

REFERENCES:
patent: 3388735 (1968-06-01), Sayce
patent: 3580657 (1971-05-01), Sheridon
patent: 3623798 (1971-11-01), Sheridon
patent: 3669673 (1972-06-01), Senih et al.
patent: 3733258 (1973-05-01), Hanak et al.
patent: 3743507 (1973-07-01), Senih et al.

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