Coating processes – Nonuniform coating – Applying superposed diverse coatings or coating a coated base
Reexamination Certificate
2005-09-27
2005-09-27
Michener, Jennifer (Department: 1762)
Coating processes
Nonuniform coating
Applying superposed diverse coatings or coating a coated base
C427S230000, C427S235000, C427S236000, C427S256000, C427S258000, C427S264000, C427S271000, C427S277000, C427S299000, C427S300000, C427S301000, C427S304000, C427S305000, C427S355000, C427S407100, C427S407200, C427S419100, C427S419200, C427S419300, C427S419800
Reexamination Certificate
active
06949269
ABSTRACT:
A method is taught for fabricating patterned silicon dioxide layers on process areas disposed perpendicularly or at an inclination to a substrate surface. Firstly, a starter layer having leaving groups is produced by non-conformal deposition of a reactive component. Tris(tert-butoxy)silanol is subsequently added. The addition of the tris(tert-butoxy)silanol leads to the formation of a silicon dioxide layer selectively only on the starter layer.
REFERENCES:
patent: 2004/0043149 (2004-03-01), Gordon et al.
patent: 0 223 987 (1987-06-01), None
patent: 02/27063 (2002-04-01), None
K.A. Miller et al.: “Self-limiting chemical vapor deposition of an ultra-thin silicon oxide film using tri-(tert-butoxy)silanol”,Thin Solid Films, vol. 397, 2001, pp. 78-82.
Dennis Hausmann et al.: “Rapid Vapor Deposition of Highly Conformal Silica Nanolaminates”,Science, vol. 298, Oct. 11, 2002, pp. 402-406.
Gutsche Martin
Seidl Harald
Greenberg Laurence A.
Infineon - Technologies AG
Locher Ralph E.
Michener Jennifer
Stemer Werner H.
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