Chemistry of inorganic compounds – Silicon or compound thereof – Halogen containing
Reexamination Certificate
2006-06-06
2006-06-06
Johnson, Edward M. (Department: 1754)
Chemistry of inorganic compounds
Silicon or compound thereof
Halogen containing
C423S347000, C423S349000
Reexamination Certificate
active
07056484
ABSTRACT:
The invention relates to a method for producing trichlorosilane by reacting silicon with hydrogen, silicon tetrachloride and, optionally, hydrogen chloride, whereby the silicon is provided in comminuted form, and the silicon is mixed with a catalyst during comminution.
REFERENCES:
patent: 2380995 (1945-08-01), Rochow
patent: 4520130 (1985-05-01), Hashiguchi et al.
patent: 4676967 (1987-06-01), Breneman
patent: 6057469 (2000-05-01), Margaria et al.
patent: 41 04 422 (1992-08-01), None
patent: 0 893 408 (1999-01-01), None
patent: 1 020 472 (2000-07-01), None
K.M. Lewis and D.G. Rethwisch, 1993, Mathematical Modelling of Diffusion and Microkinetics in Direct Reactions of Silicon and in the Processing of Electronic Components,Catalyzed Direct Reactions of Silicon—Elsevier Science Publishers B.V.
K. M. Lewis and D.G. Rethwisch, 1993, By-Products From Waste Treatment for a Bench Scale Trichlorosilane/Tetrachlorosilane Direct Process,Catalyzed Direct Reactions of Silicon—Elsevier Science Publishers B.V.
Jeffrey Y.P. MUI Dietmar Seyferth, Mar. 31, 1979-Apr. 1, 1981, Low-Cost Solar Array Project Silicon Material Task, Final Report on Investigation of the Hydrogenation of SiCl4—Massachusetts Institute of Technology.
Barbara Elvers, Stephen Hawkins, William Russey and Gail Schulz, 1993, Silicon Compounds, Inorganic; vol. A 24, Ullmann's Encyclopedia of Industrial Chemistry, Fifth Completely Revised Edition.
American Chemical Society, 1984, Industrial Inorganics, vol. 101, Chemical Abstracts.
America Chemical Society, 1988, Industrial Inorganics, vol. 109, Chemical Abstracts.
Bulan Andreas
Weber Rainer
Johnson Edward M.
McGlew and Tuttle , P.C.
Solarworld Aktiengesellschaft
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