Method for producing thin metal films by vapor-deposition

Details Method for producing thin metal films by vapor-deposition Method for producing thin metal films by vapor-deposition

1989-04-12

1990-10-16

Morgenstern, Norman

Coating processes

Coating by vapor, gas, or smoke

Metal coating

427 8, 4272551, C23C 1600

Patent

active

049633945

ABSTRACT:
A method for producing thin metal films by vapor-deposition or vacuum metallization in a recipient wherein the partial pressure of the water vapor is set at the beginning of and during the process of vapor-deposition so that the metal layer is deposited in a controlled fashion such that the mechanical stresses occurring in the metal layer are minimum.

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patent: 4129167 (1978-12-01), Sigsbee
patent: 4172156 (1979-10-01), Ritter et al.
patent: 4256780 (1981-03-01), Gaerttner et al.
patent: 4331702 (1982-05-01), Hieber et al.
patent: 4395313 (1983-07-01), Lindsay et al.
patent: 4676999 (1987-06-01), Furukawa et al.
patent: 4720401 (1988-01-01), Ho et al.

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