Method for producing thin films of rare earth chalcogenides

Details Method for producing thin films of rare earth chalcogenides Method for producing thin films of rare earth chalcogenides

1984-07-18

1986-03-11

Childs, Sadie L.

Coating processes

Coating by vapor, gas, or smoke

Base includes an inorganic compound containing silicon or...

427 87, 4271261, 4271262, 427128, 427162, 427166, 4272552, C23C 1600

Patent

active

045754640

ABSTRACT:
A method for producing thin films of chalcogenides of the rare earths characterized by introducing a rare earth metal vapor into an atmosphere not containing oxygen, but containing a gaseous chalcogen as well as hydrogen, at a total pressure about 1.times.10.sup.-4, giving rise to a reaction which forms a gaseous rare earth chalcogenide. The gaseous rare earth chalcogenide is then deposited as a thin film on a substrate heated to 200.degree. C. to about 400.degree. C.

REFERENCES:
patent: 3451845 (1969-06-01), Schuler
patent: 3737345 (1973-06-01), Kudman et al.

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