Method for producing thin film particulates of controlled shape

Details Method for producing thin film particulates of controlled shape Method for producing thin film particulates of controlled shape

1989-06-15

1992-03-31

Lowe, James

Plastic and nonmetallic article shaping or treating: processes

Gas or vapor deposition of article forming material onto...

75954, 264221, C23C 1400, C23C 1600, B29C 4100

Patent

active

051005999

ABSTRACT:
Particulate matter having precisely controlled length, width, thickness (i.e., height) and shape is produced with photolithographic techniques using a release film. In accordance with the method, a first photoresist layer is cured upon a substrate and a second photoresist layer is selectively cured upon the first photoresist to provide a desired pattern. The uncured portions of the second photoresist layer are removed so that a plurality of first and second deposition sites are produced wherein each said first and second deposition site has the desired area and wherein each first deposition site is located in a first plane and each second deposition site is located in a second plane. Further, portions of the substrate which are not part of the first deposition site are not located in the first plane and portions of the substrate which are not part of a second deposition site are not located in the second plane. The desired material is deposited using line-of-sight chemical deposition techniques. The particulate matter produced thereby may then be removed using a wash and may be separated from the wash. Particulate having a controlled area and thickness will result.

REFERENCES:
patent: 3561993 (1971-02-01), Geffcken
patent: 4116710 (1978-09-01), Heikel
patent: 4250127 (1981-02-01), Warren et al.
patent: 4278710 (1981-07-01), Jelks
patent: 4321087 (1982-03-01), Levine et al.

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