Method for producing thin film and apparatus therefor

Coating processes – Centrifugal force utilized

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118 52, 118 64, 118725, 118728, 4272481, 4272555, 427314, B05D 312, C23C 1600

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056352417

ABSTRACT:
A method and an apparatus for producing a thin film. The method includes the steps of placing a substrate having a surface for receiving the thin film on a substrate holder disposed within a thin film production chamber, the production chamber being connected by an arm to a rotatable member; charging into the thin film production chamber a material to be deposited on the surface of the substrate; rotating the rotatable member to generate a centrifugal force thereby creating a gravity field throughout the production chamber having a direction toward the surface of the substrate; heating the substrate; and evaporating the material to be deposited by heating thereby accelerating the material to be deposited toward the surface of the substrate in a direction of the gravity field, whereby the material to be deposited is deposited on the surface of the substrate. Alternatively, the steps of charging and evaporating can be replaced with the step of supplying a raw gas of a material to be deposited as the thin film on the surface of the substrate via piping disposed within the rotatable member and the arm thereby accelerating the gas toward the surface of the substrate in a direction of the gravity field for decomposing the gas whereby the material to be deposited is deposited on the surface of the substrate.

REFERENCES:
patent: 4116161 (1978-09-01), Steube
patent: 4758449 (1988-07-01), Kimura et al.
patent: 5012158 (1991-04-01), Nakatani et al.
patent: 5196101 (1993-03-01), Thakoor
patent: 5198272 (1993-03-01), Eisfeller

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