Method for producing single electron semiconductor element

Semiconductor device manufacturing: process – Having organic semiconductive component

Reexamination Certificate

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C438S778000, C438S780000, C438S962000, C257SE21370, C257SE21452, C977S773000

Reexamination Certificate

active

07419849

ABSTRACT:
The present invention provides a method for production of a single electron semiconductor element (SET) in which a quantum dot is selectively arranged in a nano gap between fine electrodes, whereby the product yield is significantly improved, leading to excellent practical applicability. The method for production of SET of the present invention is characterized in that a solution containing ferritin including a metal or semiconductor particle therein, and a nonionic surfactant is dropped on a substrate having a source electrode and a drain electrode formed by laminating a titanium film and a film of a metal other than titanium, whereby the ferritin is selectively arranged in a nano gap between the source electrode/drain electrode.

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patent: 2005/0139819 (2005-06-01), Hwang et al.
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Dutta, A., et al., “Single-Electron Tunneling Devices Based on Silicon Quantum Dots Fabricated by Plasma Process” Japanese Journal of Applied Physics, Jan. 2000, pp. 264-267, vol. 39, Pt. 1, No. 1, Publication Board, Japanese Journal of Applied Physics.
Sato, T., et al., “Single electron transistor using a molecularly linked gold colloidal particle chain”, Journal of Applied Physics, Jul. 1997, pp. 696-701, vol. 82, No. 2, American Institute of Physics.

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